Elettra
BL 03.2 L - Spectromicroscopy

Angle-resolved photoemission microscopy

The beamline houses unique microscope designed for studies of the local band structure of the materials. VUV beam is focused into a sub-µm spot and electrons arising from the photoemission process are collected and analyzed in terms of their angular and energy distributions (ARPES). Thanks to the beam focusing the photoelectron spectrum is acquired as a function of its origin on a sample surface coordinate system. The final focusing is performed with one of the two Schwarzschild objectives designed for 27 and 74 eV of photon energy. The ARPES is performed with energy and angular resolutions down to 14 meV and 0.150 by means of internal movable electron energy analyzer mounted on precision two axes goniometer setup . The sample can be measured at 15-470 K and the sample focusing and imaging are performed thanks to the XYZR sampe scanning stage.
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Beamline Energy Resolution
28 [meV] @ 65 [eV]
242 [meV] @ 244 [eV]
37 [meV] @ 48 [eV]
Beamline Resolving Power
5 * 103 [E/deltaE] @ 27 [eV]
2.5 * 103 [E/deltaE] @ 74 [eV]
Beamline Energy Range
27 - 74 [eV]
Beamline Fixed Energy Value
23 [eV]
74 [eV]
Max Flux On Sample
3 * 1011 [ph/s] @ 74 [eV]
Spot Size On Sample Hor
0.6 - 100 [um]
Spot Size On Sample Vert
0.6 - 100 [um]
Divergence Hor
62 - 155 [urad]
Divergence Vert
57 - 153 [mrad]
Angle Of Incidence Light On Sample Value
0 - 45 [degrees]
Photon Sources

Undulator

Type
Undulator
Available Polarization
Linear horizontal
Source Divergence Sigma
X = 85 [urad], Y = 81 [urad]
Source Size Sigma
X = 244 [um], Y = 60 [um]
Deflection Parameter K
592 * 10-2
Energy Range
17 - 750 [eV]
Total Power
12 * 102 [W]
Number Of Periods
36
Period
125 [mm]
Monochromators

SGM

Energy Range
17 - 350 [eV]
Type
spherical grating - plane mirror monochromator
Resolving Power
3 * 103 [deltaE/E] @ 48 [eV]
Number Of Gratings
3
Grating Type
spherical grating
Pre-focusing Mirror Type
KB mirrors
Refocusing Mirror Type
KB mirrors
Other Optics

Schwarzschild objectives

Description
objectives composed of two spherical mirrors for final focusing
Endstations or Setup

nano-ARPES

Microscopes
Schwarzschild mirror 0.6 um resolution focal point
Spectrometer
in-vaccum ARPES analyzer mounted on goniometer
Base Pressure
2 * 10-10 [mbar]
Detectors Available
hemispherical analyzer
Endstation Operative
Yes

Sample

Sample Type
Crystal, Fiber, Other: signle or few atomic layers, domains, films
Mounting Type
glueing, clipping (spot-wealding)
Required Sample Size
X = 1 [um], Y = 1 [um]

Manipulator or Sample stage

Positioning Precision
X = 1 [nm], Y = 1 [nm], Z = 100 [nm]
Range Of Movement
X = 19 [mm], Y = 19 [mm], Z = 10 [mm]

Sample Environment

Pressure (min)
2 * 10-10 [mbar]
Pressure (Max)
1 * 10-6 [mbar]
Temperature
35 - 370 [K]

Sample Holders

Type
omicron plate
Description
has 3 electrical contacts for gating measurements by for example field effect of real devices
Type
omicron plate
Description
plate made of copper, tantalum or molibdenum
Detectors

hemispherical analyzer

Type
electrostatic hemispherical analyzer with ARPES lens column
Description
delay line MCP detector
Pixel Size
X = 30 [um], Y = 30 [um]
Array Size
X = 700 [pixel], Y = 700 [pixel]
Passive or Active (Electronics)
Active

Detection

Detected Particle
Electron
contacts
Alexey BARINOV
Techniques
Imaging
  • Scanning photoemission EM
Photoelectron emission
  • Angular Resolved PES
  • UPS
Disciplines
Material Sciences
  • Knowledge based multifunctional materials
  • Other - Material Sciences
Address
Strada Statale 14 - km 163,5 in AREA Science Park
34149 Basovizza, Trieste ITALY
control/Data analysis
Control Software Type
  • Labview
Data Output Type
  • spectra, images, EDC angular scans
Data Output Format
  • HDF5
Softwares For Data Analysis
  • Igor pro