Swiss Light Source
X11MA-SIM

Surfaces / Interfaces: Microscopy

The SIM beamline produces a high flux of soft X-rays with variable polarization from an undulator source. The beamline has a Photo-Emission Electron Microscope (PEEM) (Model: LEEM III, Elmitec GmbH) as a permanent endstation open to user via the SLS proposals system. The instrument allows to image samples using the photoelectric effect with very high spatial resolution (100 nm), chemical and magnetic sensitivity. With an energy analyzer the excited photoelectrons can be energy-selected. In addition to illumination by X-rays, illumination by low energy electrons is possible. In this low energy electron microscopy (LEEM) mode additional contrast mechanisms are available.

The PEEM is equipped with a small preparation chamber (sputtering, heating, load-lock). In addition, a more complete preparation system is available with a load-lock, LEED and Auger, several evaporation sources, rotatable electromagnetic coil, ion etching and electron bombardment heating.

Beamline Resolving Power
6000 [E/deltaE] @ 800 [eV]
Beamline Energy Range
90 - 2000 [eV]
Max Flux On Sample
1 * 1015 [ph/s] @ 1 [keV]
Photon Sources

Elliptical twin undulator UE56

Type
Undulator
Available Polarization
Linear horizontal, Linear vertical, Linear variable, Circular
Variable Polarization
Yes
Energy Range
90 - 2000 [eV]
Number Of Periods
64
Period
56 [mm]
Monochromators

Plane grating monochromator

Energy Range
90 - 2000 [eV]
Type
SX-700
Resolving Power
5000 [deltaE/E]
Number Of Gratings
3
contacts
Armin Kleibert
Carlos Vaz
Techniques
Absorption
  • NEXAFS
  • XMCD
Emission or Reflection
  • Time-resolved studies
Imaging
  • X-ray microscopy
Disciplines
Chemistry
  • Other - Chemistry
Energy
  • Sustainable energy systems
Material Sciences
  • Knowledge based multifunctional materials
  • Other - Material Sciences
control/Data analysis
Control Software Type
  • LEEM 2000
Data Output Type
  • images
Data Output Format
  • 11 bit TIFF files
Softwares For Data Analysis
  • ImageJ