5-circle commercial diffractometer (3 circles for sample orientation, 2 circles for detectors) financed by the French IRT Nanoelec programme, collaboration CEA-LETI / ESRF.
Station for high-throughput multi-characterisation R&D rapid-access needs of the micro- and nano-electronics industry.
Available X-ray characterisation techniques: in-plane and out-of-plane diffraction, both in reflection and transmission, anomalous diffraction, CD-SAXS, PDF measurements on amorphous thin layers, fluorescence, reflectivity and diffraction imaging (white and monochromatic x-ray topography, rocking curve imaging). Maximum size of 120 mm x 6 mm in the monochromatic case or of 165 mm x 7 mm in the case of white beam (FWHM). The setup is also used to measure diffuse scattering on polished surfaces or to qualify the uniformity response of detectors.
A bent multilayer bending mounted upstream (optics table) may be used to concentrate the x-ray beam in the horizontal direction down to 30 micrometers.