The TXPES (Turkish X-ray Photoelectron Spectroscopy) Beamline at SESAME is an advanced research facility designed to enable high-resolution analysis of surface and material properties. Building on the existing HESEB beamline, which includes a dedicated branch for an additional end station, the TXPES beamline's construction was led by the Turkish Energy, Nuclear, and Mineral Research Agency (TENMAK), in collaboration with Bilkent University, Koç University, and the Turkish Accelerator and Radiation Laboratory (TARLA). This initiative marks a significant milestone as SESAME’s first beamline fully designed, manufactured, and installed by Türkiye, a SESAME member country. Operating in the soft X-ray regime, TXPES specializes in characterizing a wide range of materials, including nanomaterials, thin films, and catalysts. The beamline provides invaluable insights into surface chemistry, electronic structure, and material interfaces, making it essential for research in fields such as materials science, catalysis, and thin-film technology.
The TXPES beamline is designed with advanced optical components for precise beam control, ensuring high-resolution surface and materials science analysis. Its photon source, an APPLE II undulator, offers both circular and linear polarization across a photon energy range of 70 eV to 1800 eV, enabling the probe of various elements and chemical states. The beamline includes a Plane Grating Monochromator (PGM) for precise photon energy tuning, optimized for high-resolution studies, and a Beam Splitter Unit (M3) to allow interchangeable operation with the HESEB branch. The optics configuration also includes a Horizontally Defining Slit with a beam monitoring system (YAG:Ce screen and CCD camera), an Energy Slit for fine photon energy control, and the M4b Mirror System for maintaining beam collimation across experimental conditions.
The TXPES Beamline is equipped with advanced instrumentation designed to support a wide array of surface and materials science experiments. The Analysis Chamber is at the heart of the beamline, offering tools for high-precision X-ray Photoelectron Spectroscopy (XPS) and Ultra-Violet Photoelectron Spectroscopy (UPS) measurements. This chamber houses the PHOIBOS 150 CMOS XPS/LEIS Analyzer and UVS 10 UV Source for detailed characterization of surface electronic properties. Additionally, it includes an Electron Flood Gun for charge compensation and a Rastering Ion Gun for Low Energy Ion Scattering (LEIS) and depth profiling, providing comprehensive surface and elemental analysis.The High-Pressure Chamber allows for experiments under elevated pressures, simulating realistic conditions for catalysis and surface reaction studies. Equipped with HPC-20 High-Pressure Cells, it enables the study of materials under near-operational environments. The Preparation Chamber is optimized for sample conditioning and surface analysis, featuring Low Energy Electron Diffraction (LEED) for structural surface characterization and a Quadrupole Mass Spectrometer (QMS) for gas composition monitoring. It also includes tools for material processing, such as Metal and Metal Oxide Evaporators and a 4-axis Manipulator with cooling and heating capabilities. The Load Lock Chamber ensures seamless sample transfer while maintaining high-vacuum conditions, essential for preserving the integrity of sensitive experiments. Together, these specialized chambers offer unmatched flexibility, allowing researchers to conduct a wide range of studies on materials under varying environmental conditions.
UE56 APPLE I I
UV 10 Ultraviolet Light Source
He I (21.2 eV, 58.4 nm), He II (40.8 eV, 30.4 nm)
XR50 Dual Anode Source-1
XR50 Dual Anode Source-2
Plane Grating Monochromator (PGM)
Horizontally Defining Slit (HDS)
M1
M3b
It allows switching between the HESEB and TXPES beamlines, ensuring flexibility in beamline operation.
M4b
Vertically Defining Slit (VDS)
Analysis Chamber
The XR 50 Dual Anode X-ray Source provides a stable X-ray supply for XPS, ensuring continuity during maintenance periods when synchrotron radiation is unavailable, albeit with reduced resolution. For UPS, the UVS 10 ultraviolet (UV) source enables detailed studies of electronic structures, including valence band characterization and work function determination. In addition to XPS and UPS, the system supports Angle-Resolved Photoemission Spectroscopy (ARPES), which is critical for mapping electronic band structures. ARPES provides key insights into the dispersion relations of electrons in momentum space, offering a deep understanding of the electronic properties of advanced materials such as topological insulators, superconductors, and 2D materials. These capabilities are invaluable for unraveling the fundamental physics governing these complex systems.
To ensure measurement accuracy, an electron flood gun is employed to neutralize surface charging during XPS measurements, especially for insulating samples. The rastering ion gun enables precise LEIS analysis and XPS depth profiling, allowing controlled removal of surface layers for elemental composition analysis at varying depths.
The chamber also includes a 4-axis sample manipulator with liquid nitrogen cooling down to below 100 K and electron-beam heating up to 1200 K. This feature ensures precise sample positioning and temperature control, making it indispensable for temperature-dependent experiments, such as catalytic reaction studies, phase transitions, and other dynamic processes.
Sample
Manipulator or Sample stage
High-Pressure Chamber
Sample
Load Lock Chamber
Sample
Preparation Chamber
A Quadrupole Mass Spectrometer (QMS) is integrated into the system to perform residual gas analysis (RGA), which is essential for maintaining ultra-high vacuum (UHV) conditions by continuously monitoring gas levels and detecting potential leaks. Metal and metal oxide evaporators enable the deposition of thin films directly within the chamber, allowing precise control over material interfaces and detailed investigations into thin-film growth mechanisms. Gas dosers provide accurate delivery of reactive gases, making them indispensable for catalysis studies and examining surface reactions.
The chamber is also equipped with a 4-axis manipulator capable of liquid nitrogen cooling to temperatures below 100 K and e-beam heating up to 1200 K. This ensures precise control over sample temperature and positioning, enabling a wide variety of experimental setups to be conducted under optimal conditions.
Sample
Manipulator or Sample stage
2D CMOS DETECTOR
counting. It consists of an MCP Chevron assembly with phosphorous screen and a fast camera
system with a high frame rate at full image resolution. Thus, it can handle large quantities
of event-style electron data.
Detection
SPECS PHOIBOS 150 Electron Energy Analyzer
Detection
- Surface diffraction
- Mass spectrometry
- Angular Resolved PES
- Photoelectron diffraction
- UPS
- XPS
- Elastic scattering
- Small angle scattering
- Atoms, molecules, clusters and gas-phase chemistry
- Biochemistry
- Catalysis
- Electrochemistry
- Green Chemistry
- Physical Chemistry
- Geology
- Mineralogy
- Sustainable energy systems
- Nanotechnology & production processes
- Medicine
- Technique Development - Life Sciences & Biotech
- Knowledge based multifunctional materials
- Metallurgy
- Other - Material Sciences
- Technique Development - Material Sciences
- Atomic & molecular physics
- Surfaces, interfaces and thin films
Next to Princess Rahma University College P.O. Box 7, Allan 19252, Jordan
- SpecsLab Prodigy
- SpecsLab Prodigy(.sle), SpecsLab 2(.xml), XY Export(.xy), VAMAS Export(.vms)
- SpecsLab Prodigy(.sle), SpecsLab 2(.xml), XY Export(.xy), VAMAS Export(.vms)
- SpecsLab Prodigy
