The target of the beamline is the generation and application of attosecond pulses at a repetition rate of 100 kHz, using high-order harmonic generation (HHG) in noble gases. The beamline provides users of ELIALPS facility with attosecond and auxiliary pulses to perform pump-probe experiments with attosecond time resolution. The beamline is designed to ensure a flexible reconfiguration in order to optimize the
parameters of the attosecond pulses in Phase 1 and Phase 2 of HR laser. It also includes reliable diagnostics for the temporal, spectral and spatial characterization of the attosecond pulses. The beamline is designed for two-colour experiments: XUV attosecond pump (probe) pulses and fundamental visible/near infrared (VIS/NIR) probe (pump) pulses. XUV pulses are generated in a cell filled with gas at static pressure. The XUV spectra of the attosecond pulses can be continuously measured during the experiments to monitor the stability and the spectral characteristics of the XUV radiation. The
beamline contains two target regions. The first one is used for temporal characterization of attosecond pulses, while the second one can be used for the allocation of a user-defined end station.
General purpose chemistry laboratory, which supports the sample/target preparation of the users. It is equipped with the basic chemistry laboratory tools. These include (among others):
- Glovebox with controlled O2 and H2O content
- Fume hoods
- Analytical balance
- Plasma cleaner
- Ultrasonic bath
- Temperature controlled water bath
- pH meter
- High temperature furnace
- Vacuum dryer with heating capacity
- General purpose glassware and plasticware (beakers, pipettes, vials)
In addition, a state-of-the-art electrochemical workstation is also available, which includes a potentiosat/galvanostat with fast sampling capabilities, equipped with electrochemical impedance spectroscopy module as well as IMPS/IMVS setup.
Serious contribution to the Research Technology installations / commissioning, including each primary sources and beamlines, PSS, MPS, timing, DAQI and all the related facility systems. Highly equipped electrical workshop to allow members and users to access full spectrum of available solutions.
Some of the core capabilities/main instruments:
Merge together traditional milling- and high-end CNC technology. Precision machining, welding, assembling, 3D coordinate measurements, CAM programming and rapid prototyping, just a few from the core capabilities.
Our main device at the Nano Science Laboratory of ELI-ALPS is a RAITH eLINE Plus electron beam lithography system with ultrahigh resolution. The system comprises of a scanning electron microscope based imaging tool equipped with fast electrostatic beam-blanking and pattern generator allowing the electron beam exposure of different resists along predefined routes/lines/shapes. The beam energy is selectable between 20 eV and 30keV. During electron beam exposure the x-y positioning of the sample is ensured by a laser interferometer controlled stage on a 100 mm x 100 mm travel range with 1 nm positioning resolution, and the device is equipped with an automated height sensing unit. The size of the write fields can be adjusted from 0.5 micron to 2 mm, the minimal beam size at 20 kV accelerating voltage is 1.6 nm. The minimum periodicity of the gratings produced by the system does not exceed 40 nm, and the minimum feature size is smaller than 8 nm. For imaging, the system is equipped with an off-axis Everhart-Thornley secondary electron detector and an in lens, combined secondary and backscattered electron detector. Analyzing the chemical composition of the investigated samples is also possible with an X-ray spectrometer and energy dispersive microanalysis system (EDS), capable to detect elements with atomic number between 5-95. The system is equipped with a 3D Module having a motorized arrangement for rotating and tilting samples of size 10 mm x 10 mm with tilt angles between 0 - 90 degree and rotation angles between 0 - 360 degree.
The laboratory has the equipment necessary for resist preparation, i.e. a spin-coater, a plasma cleaner, a hot-plate and ultrasonic bath are available.
As a member of the Optical Preparatory Workshops the Optical Metrology Lab is providing comprehensive optical measurement and characterization services. It works as the quality control laboratory for the incoming optics where all the specified parameters are investigated. Additionally the lab of course host the measurements for the in-house activities.
Spectrophotometer UV-Vis-NIR, PerkinElmer Lambda 1050 equipped with
-URA (Universal Reflectance Accessory) AOI=8÷65°
-DRA (Diffuse Reflectance Accessory), ø60mm and ø150mm integrating sphere
-GPOB (General Purpose of Optical Bench) for gratings and complex optical sub-systems
ZYGO laser interferometer for surface form measurements equipped with
λ/20@633nm reference plan/sphere for AR and HR coated optics respectively (no compromise with attenuators)
Spectrally resolved WL interferometer for spectral phase (GDD) measurements
-Vis-NIR spectral range (500-1400nm)
-Fits 0.5”-12” optics
-AOI=0÷50°; S- and P-pol respectively
Spectroscopic Ellipsometer SEMILAB SE-2000 (rotating compensator)
-Phase and phase-shift characterisation
-UV-Vis-NIR range (193-1690nm)
-Complex indices investigation
-Surface morphology and coating stack structures
Measuring equipment for Lenses and Optical systems
-+/- FL as well as BFL
-CX and CC radii
Application oriented in-house systems
-Sources (WL, stab. HeNe, photodiodes, supercontinuum)
-Detectors (spectrometers for Vis-NIR range)
As a member of the Optical Preparatory Workshops the Polishing workshop is dedicated to custom optical fabrication/finishing, including substrate refurbishing.
Every kind of geometrical attributes can be achieved in-house prepared from rough materials (glass, fused silica, crystals, metals and ceramics) within the dimensions dia. 10-200mm / radii 5-0mm. Optical, mechanical tolerances according to ISO standards.
5D CNC optical processing center (max. dia.250mm)
NC controlled Optic cutter
Laser interferometer (4" vertical) for surface form measurements
Traditional lever machine for precision polishing
Manual polishing machine for correction polishing
As a member of the Optical Preparatory Workshops the Thin Film Coating Lab is intended to serve any kind of custom optical multilayer coating request. In our facility we have a HV coating system equipped with a variety of deposition sources e.g. 2* resistance (thermal) sources for proper metal films, a multi-pocket electron beam source for dielectrics, with a KRI end-Hall ion-source for adequate substrate cleaning as well as ion-assisted deposition. Apart from that we have 2 magnetrons that can be switched between both from RF/DC power supplies in order to allow us to do sequential sputtering of complex multilayer structures if needed. For better homogeneity we have flat (for sputtering), calotte (semi-spherical for evaporation) and planetary gear substrate holders, due to different source characteristics. We use OptiLayer thin film software(s) to characterize, design and reverse-engineer coatings. This all comes with the flexibility to iterate problems directly with the colleagues/users in-house.
Vacuum technology and equipment assembly group is responsible to implementation related activities, especially vacuum, optics and optomechanics as well as cleanroom services. The group maintains a small complementary workshop that is dedicated to some milling capabilities allowing colleagues to modify mechanical parts in urgent cases; and has an off-line vacuum system for demonstration, training, measurement and calibration purposes. The group provide a variety of cleaning techniques based on the application that requires vacuum cleanliness. This of course comes with adequate metrology support.
-RGA analysis, vacuum gauge calibration, specimen degassing rate measurement, etc
-dedicated and disposable cleanroom garments, cleanroom consumables and comprehensive maintenance service