GALAXIES beamline is dedicated to inelastic x-ray scattering (IXS) and hard x-ray photoemission (HAXPES). These spectroscopic techniques are powerful probes to characterize the electronic properties of materials. The beamline is optimized to operate in the 2.3 et 12 keV energy range with high resolution and micro beam.

Beamline Energy Resolution
1 [eV] @ 8000 [eV]
1 * 10-1 [eV] @ 8000 [eV]
Beamline Resolving Power
1 * 10-4 [deltaE/E] @ 8000 [eV]
1 * 10-5 [deltaE/E] @ 8000 [eV]
Beamline Energy Range
2.3 - 12 [keV]
Max Flux On Sample
5 * 1013 [ph/s] @ 2.3 [eV]
Spot Size On Sample Hor
15 - 80 [um]
Spot Size On Sample Vert
15 - 30 [um]
Photon Sources

U20 in-vacuum undulator

Type
Undulator
Available Polarization
Linear horizontal
Energy Range
2 - 15 [keV]
Number Of Periods
98
Period
20 [mm]
Monochromators

DCM

Energy Range
2300 - 12000 [eV]
Type
Crystal monochromator: Si(111)
Resolving Power
1.0E-5 [deltaE/E] @ 10000 [eV]

HRM

Energy Range
4 - 12 [keV]
Type
4 bounce high resolution monochromator.
- 4 x Si(220) (symmetric)
- 4 x Si(220) (asymmetry angle, 9°)
Resolving Power
1 * 105 [E/deltaE] @ 10000 [eV]
Endstations or Setup

HAXPES

Description
The HAXPES station consists in an analysis chamber equiped with a 4-axes manipulator associated to a cryogenic system (20 K) for solid sample and a cell for measurements on gas phase. The analyzer is placed in the horizontal plane, at 90° from the incident beam. A preparation chamber, coupled to the analysis chamber, permits the in-vaccum transfert of samples. The chamber hosts an ion gun, evaporators and a LEED pour sample characterization.
Spectrometer
HAXPES photoemission

Sample

Sample Type
Crystal, Liquid, Gas
Mounting Type
Omicron

Techniques usage

Photoelectron emission / XPS
XPS in the high kinetic energy range (up to 12 keV)

Manipulator or Sample stage

Degrees Of Freedom
4

Sample Environment

Description
low pressure gas cell
Pressure (Max)
1 * 10-5 [mbar]
Description
in-situ control of sample polarisaton
Description
liquid microjet setup
Temperature
15 - 1200 [K]

Sample Holders

RIXS

Description
The RIXS spectrometer is composed of two scattering arms working in the horizontal and / or vertical scattering plane, a detector arm and a sample stage.
Spectrometer
RIXS spectrometer

Sample

Sample Type
Liquid
Other Sample Type
Solid

Techniques usage

Absorption / NEXAFS
High resolution absorption spectroscopy (HERFD)
Absorption / XMCD
Possibility to combine RIXS / XES / XAS and MCD
Emission or Reflection / X-ray fluorescence (XRF)
High resolution X-ray emission spectroscopy
Scattering / Inelastic scattering
non resonant IXS, RIXS, X-ray Raman Scattering

Manipulator or Sample stage

Sample Environment

Description
diamond anvil cells
Pressure (min)
1 [GPa]
Pressure (Max)
100 [GPa]
Temperature
15 - 300 [K]
Description
resistive oven
Temperature
300 - 1200 [K]
Description
liquid microjet setup
Temperature
15 - 300 [K]

Magnetic Fields

DC Fields
electromagnet
Max DC Field
1.2 [T]
Techniques
Absorption
  • NEXAFS
  • XMCD
Emission or Reflection
  • X-ray fluorescence (XRF)
Photoelectron emission
  • XPS
Scattering
  • Inelastic scattering
Disciplines
Chemistry
  • Catalysis
  • Electrochemistry
  • Physical Chemistry
Earth Sciences & Environment
  • Mineralogy
Energy
  • Other - Energy
Material Sciences
  • Other - Material Sciences
Physics
  • Hard condensed matter - electronic properties
  • Hard condensed matter - structures
  • Matter under extreme conditions, warm dense matter, plasmas
  • Other - Physics
  • Quantum electronics & optics
  • Surfaces, interfaces and thin films
  • Technique Development - Physics
control/Data analysis
Control Software Type
  • Python
Data Output Type
  • spectra, images
Data Output Format
  • Nexus
Softwares For Data Analysis
  • Python, Igor, Matlab
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