X-Ray Interference Lithography

The X-ray interference lithography facility at the Swiss Light Source (SLS) is a unique tool to obtain periodic nanostructures with periods as small as 25nm.The beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. Because of this the technique is also called Extreme-Ultraviolet Interference Lithography (EUV-IL).

Beamline Energy Resolution
70 [eV]
Yasin Ekinci
  • X-ray lithography
control/Data analysis
Control Software Type
  • tbd
Data Output Type
  • tbd
Data Output Format
  • tbd
in partnership with